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Title:
EUV LIGHT SOURCE DEVICE
Document Type and Number:
WIPO Patent Application WO/2010/147214
Kind Code:
A1
Abstract:
Disclosed is a cleaning method which makes it possible to remove debris adhering to an optical element in a chamber. An EUV light source device in which EUV light is generated from plasma generated by irradiation of a target substance with laser light includes: a chamber in which EUV light is generated; an electromagnetic field generating unit which generates an electric field or magnetic field within the chamber; and a cleaning unit which charges debris adhering to the optical element inside the chamber, thereby detaching the debris from the optical element, or which detaches the debris from the optical element and charges said debris.

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Inventors:
KAKIZAKI KOUJI (JP)
NAGAI SHINJI (JP)
YANAGIDA TATSUYA (JP)
Application Number:
PCT/JP2010/060376
Publication Date:
December 23, 2010
Filing Date:
June 18, 2010
Export Citation:
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Assignee:
GIGAPHOTON INC (JP)
KAKIZAKI KOUJI (JP)
NAGAI SHINJI (JP)
YANAGIDA TATSUYA (JP)
International Classes:
H01L21/027
Foreign References:
JP2006080255A2006-03-23
JP2008277522A2008-11-13
JPH09260245A1997-10-03
JP2008277529A2008-11-13
JP2005197456A2005-07-21
JP2009021566A2009-01-29
JP2008042078A2008-02-21
Attorney, Agent or Firm:
UTSUNOMIYA Masaaki et al. (JP)
Masaaki Utsunomiya (JP)
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