EUV LIGHT SOURCE WITH SPECTRAL PURITY FILTER AND POWER RECYCLING

Title:

EUV LIGHT SOURCE WITH SPECTRAL PURITY FILTER AND POWER RECYCLING

Document Type and Number:

WIPO Patent Application WO/2016/131069

Kind Code:

A3

Abstract:

A plasma-generated EUV light source uses an EUV-diffracting collection mirror (103) to channel spectrally pure in-band radiation through an intermediate-focus aperture (105) and through EUV illumination optics. Out-of-band radiation (1102) is either undiffracted by the collection mirror or is diffractively scattered away from the aperture. The undiffracted portion, plus plasma-emitted radiation that does not intercept the collection mirror, can be efficiently recycled back to the plasma (102) via retroreflecting mirrors (1101;1103), cat's-eye reflectors, or corner-cube reflectors, to enhance generation of in-band EUV radiation by the plasma.

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Inventors:

JOHNSON KENNETH CARLISLE (US)

Application Number:

PCT/US2016/034172

Publication Date:

October 06, 2016

Filing Date:

May 25, 2016

Export Citation:

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Assignee:

JOHNSON KENNETH CARLISLE (US)

International Classes:

G02B5/122; G03F7/20; G02B5/18; G02B5/20; G21K1/06; H01S3/08; H05G2/00

Foreign References:

US20120248342A1	2012-10-04
US20130207004A1	2013-08-15
EP1650786A1	2006-04-26
US20130027681A1	2013-01-31
JPH0540223A	1993-02-19
JPH06118379A	1994-04-28

Other References:

KRIESE M ET AL: "Development of an EUVL collector with infrared radiation suppression", PROCEEDINGS OF THE SPIE - THE INTERNATIONAL SOCIETY FOR OPTICAL ENGINEERING SPIE - THE INTERNATIONAL SOCIETY FOR OPTICAL ENGINEERING USA, vol. 9048, 2014, XP002760472, ISSN: 0277-786X
TROST M ET AL: "Structured Mo/Si multilayers for IR-suppression in laser-produced EUV light sources", OPTICS EXPRESS 20131118 OPTICAL SOCIETY OF AMERICAN (OSA) USA, vol. 21, no. 23, 18 November 2013 (2013-11-18), pages 27852 - 27864, XP002760473, DOI: 10.1364/OE.21.027852

Attorney, Agent or Firm:

SLONE, David N. et al. (Two Embarcadero Center Suite 190, San Francisco California, US)

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