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Title:
EVACUATION APPARATUS
Document Type and Number:
WIPO Patent Application WO2005038255
Kind Code:
B1
Abstract:
The present invention relates to an evacuation apparatus for evacuating a vacuum chamber of a substrate processing apparatus for processing a substrate such as a semiconductor wafer or liquid crystal panel. An evacuation apparatus according to the present invention includes a first vacuum pump connected to a vacuum chamber, and a second vacuum pump connected to the first vacuum pump. The first vacuum pump has a pair of multistage pump rotors.

Inventors:
KAWAMURA TAKESHI (JP)
KAGAWA KOICHI (JP)
Application Number:
PCT/JP2004/015563
Publication Date:
December 29, 2005
Filing Date:
October 14, 2004
Export Citation:
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Assignee:
EBARA CORP (JP)
KAWAMURA TAKESHI (JP)
KAGAWA KOICHI (JP)
International Classes:
C23C16/44; F04B49/06; F04C18/00; F04C18/12; F04C18/16; F04C21/00; F04C23/00; F04C25/02; F04C28/02; F04C28/08; F04C29/00; (IPC1-7): F04C18/00; C23C16/44
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