EVAPORATION MASK, AND PRODUCTION METHOD AND PRODUCTION APPARATUS FOR ORGANIC EL ELEMENT USING EVAPORATION MASK

WIPO Patent Application WO/2011/148750

A1

Disclosed is an evaporation mask (70) provided with a first layer (71), a second layer (72), and a third layer (73) in this order. A plurality of first openings (71h), a plurality of second openings (72h), and a plurality of third openings (73h) are formed in the first layer, the second layer, and the third layer, respectively. Mask openings (75) are respectively comprised of the first openings, the second openings, and the third openings, which communicate with one another. The dimension of each second opening is larger than the dimension of each first opening and the dimension of each third opening. Thus, the mask openings can be prevented from reducing in dimension or clogging due to adhesion of evaporated particles.

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INOUE SATOSHI
KAWATO SHINICHI
HAYASHI NOBUHIRO
SONODA TOHRU

PCT/JP2011/060150

December 01, 2011

April 26, 2011

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SHARP KK (JP)
INOUE SATOSHI
KAWATO SHINICHI
HAYASHI NOBUHIRO
SONODA TOHRU

H05B33/10; C23C14/24; H01L51/50

JP2004247058A	2004-09-02
JP2004349101A	2004-12-09
JP2005154879A	2005-06-16
JP2004039319A	2004-02-05
JP2001237072A	2001-08-31
JP2003297562A	2003-10-17

IKEUCHI SATO & PARTNER PATENT ATTORNEYS (JP)
Patent business corporation Ikeuchi and Sato and partners (JP)

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