EXAMINATION METHOD AND EXAMINATION DEVICE

WIPO Patent Application WO/2017/073604

A1

In the present invention, light from a light source is projected onto a mask via a high-resolution optical system, and high-resolution optical image data is obtained. In addition, such light is projected onto the same mask via a low-resolution optical system, and low-resolution optical image data is obtained. The design data of a mask pattern is corrected so that reflected in the design data are the mask-pattern shape and dimensions stipulated by a manufacturing process for a mask and/or a manufacturing process for a semiconductor device manufactured by transferring a mask pattern onto a semiconductor substrate. From the corrected design data, generated are reference image data items which respectively correspond to the high-resolution optical image data and the low-resolution optical image data. By referencing the information of a fault in the low-resolution optical image data, a determination is made as to whether a fault detected in the high-resolution optical image data is a genuine fault or a pseudo fault.

JPWO2007023891	Lighting device
JPH07134103	APPARATUS AND METHOD FOR SURFACE INSPECTION
JP2003506801	INDUSTRIAL APPLICABILITY: Object inspection device and method

INOUE HIROMU (JP)
KIKUIRI NOBUTAKA (JP)

PCT/JP2016/081707

May 04, 2017

October 26, 2016

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NUFLARE TECHNOLOGY INC (JP)

G01N21/956; G01B11/30; G03F1/84

JP2014206466A	2014-10-30
JP2010223838A	2010-10-07
JP2005148320A	2005-06-09
JP2009109382A	2009-05-21
JP2006046943A	2006-02-16
US20120134542A1	2012-05-31

KURATA, Masatoshi et al. (JP)

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