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Patent Searching and Data


Title:
EXCIMER LASER DEVICE AND ELECTRONIC DEVICE PRODUCTION METHOD
Document Type and Number:
WIPO Patent Application WO/2019/111315
Kind Code:
A1
Abstract:
This excimer laser device comprises an etalon spectrometer for measuring a fringe waveform from laser light and a controller which determines the surface area of a first proportion of spectral space obtained on the basis of measurement results from the etalon spectrometer and calculates a first spectral line width of the laser light on the basis of the determined surface area of the first proportion, and the controller further calibrates the first spectral line width on the basis of a correlation function indicating a correlation between the first spectral line width and a second spectral line width of the laser light measured by a reference measurement apparatus.

Inventors:
ISHIDA KEISUKE (JP)
MORIYA MASATO (JP)
KOUNO NATSUHIKO (JP)
ASAYAMA TAKESHI (JP)
KUSAMA TAKASHI (JP)
Application Number:
JP2017/043600
Publication Date:
June 13, 2019
Filing Date:
December 05, 2017
Export Citation:
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Assignee:
GIGAPHOTON INC (Postcode3238558, JP)
International Classes:
H01S3/134; G03F7/20; H01S3/137
Domestic Patent References:
WO2017098625A12017-06-15
WO2006006499A12006-01-19
Foreign References:
JP2003243752A2003-08-29
JP2009267097A2009-11-12
JP2009505116A2009-02-05
JP2004271498A2004-09-30
US6317448B12001-11-13
Attorney, Agent or Firm:
HOSAKA, Nobuhisa (Postcode1010025, JP)
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