EXHAUST GAS PROCESSING SYSTEM - JX NIPPON OIL & ENERGY CORPORATION

Title:

EXHAUST GAS PROCESSING SYSTEM

Document Type and Number:

WIPO Patent Application WO/2012/014497

Kind Code:

A1

Abstract:

In the present disclosures, a mixed gas containing monosilane is discharged from a semiconductor production device (1). A pump unit (2) sucks the mixed gas discharged from the semiconductor production device (1), and sends the mixed gas to a later-stage silane gas processing unit (20). Argon gas is used as a purging gas in the pump unit (2). The silane gas processing unit (20) process the mixed gas that contains at least monosilane and argon and that is discharged from the semiconductor production device (1) through the pump unit (2), and isolates, recovers, and recycles the monosilane. A noble gas processing unit (30) isolates, recovers, and recycles the argon from the mixed gas. The argon recovered by the noble gas processing unit (30) is used as the purging gas of the pump unit (2).

Inventors:

OHUCHI, Tai (6-3 Otemachi 2-chome, Chiyoda-k, Tokyo 62, 〒1008162, JP)
大内　太 (〒62 東京都千代田区大手町二丁目６番３号ＪＸ日鉱日石エネルギー株式会社内 Tokyo, 〒1008162, JP)
OKABE, Takashi (6-3 Otemachi 2-chome, Chiyoda-k, Tokyo 62, 〒1008162, JP)

Application Number:

JP2011/004329

Publication Date:

February 02, 2012

Filing Date:

July 29, 2011

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Assignee:

JX NIPPON OIL & ENERGY CORPORATION (6-3 Otemachi 2-chome, Chiyoda-ku Tokyo, 62, 〒1008162, JP)
ＪＸ日鉱日石エネルギー株式会社 (〒62 東京都千代田区大手町二丁目６番３号 Tokyo, 〒1008162, JP)
OHUCHI, Tai (6-3 Otemachi 2-chome, Chiyoda-k, Tokyo 62, 〒1008162, JP)
大内　太 (〒62 東京都千代田区大手町二丁目６番３号ＪＸ日鉱日石エネルギー株式会社内 Tokyo, 〒1008162, JP)

International Classes:

B01D53/46; C01B33/04; H01L21/205

Attorney, Agent or Firm:

MORISHITA, Sakaki (2-11-12, Ebisu-Nishi Shibuya-k, Tokyo 21, 〒1500021, JP)

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