EXHAUST GAS TREATMENT DEVICE AND METHOD FOR CONTROLLING SAME

Title:

EXHAUST GAS TREATMENT DEVICE AND METHOD FOR CONTROLLING SAME

Document Type and Number:

WIPO Patent Application WO/2014/174609

Kind Code:

A1

Abstract:

　Provided are an exhaust gas treatment device and a method for controlling the same, the exhaust gas treatment device being capable of maintaining the concentration of particulate matter (PM) in exhaust gas in an outlet of an exhaust gas treatment device (DPF) within a specific value, even when the PM concentration significantly increases at times such as engine start-up, in addition to when the PM concentration is low. The control method includes: a step for applying AC current to a pre-stage electrode (2), generating thermal non-equilibrium plasma between electrode plates (4) of the pre-stage electrode (2), and charging the particulate matter (PM); and a step for performing first control under a first condition to apply DC current to a post-stage electrode (3) and cause the electrode plates (4) of the post-stage electrode (3) to attract the particulate matter, and performing second control under a second condition to apply AC current to the post-stage electrode (3) and generate thermal non-equilibrium plasma between the electrode plates (4) of the post-stage electrode (3) to oxidize the particulate matter.

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Inventors:

KATO TOSHIHITO (JP)
NOZU MASASHI (JP)
MATSUOKA KATSUNORI (JP)
IMAI KANEHISA (JP)

Application Number:

PCT/JP2013/062062

Publication Date:

October 30, 2014

Filing Date:

April 24, 2013

Export Citation:

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Assignee:

MITSUI SHIPBUILDING ENG (JP)

International Classes:

F01N3/01; B03C3/41; B03C3/47; B03C3/68; F01N3/02

Domestic Patent References:

WO2009119845A1

2009-10-01

Foreign References:

JPH11216391A	1999-08-10
JP2001025682A	2001-01-30
JP2000024545A	2000-01-25
JPS59127621A	1984-07-23
JP2002213228A	2002-07-31
JP2013087696A	2013-05-13

Attorney, Agent or Firm:

Seiryu Patent Professional Corporation et al. (JP)
Clear stream international patent business corporation (JP)

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