EXHAUST STRUCTURE AND EXHAUST METHOD FOR FLOW RATE CONTROL DEVICE, AND GAS SUPPLY SYSTEM AND GAS SUPPLY METHOD COMPRISING SAME

WIPO Patent Application WO/2023/182105

A1

An exhaust structure for a flow rate control device 10 is provided with: the flow rate control device 10, which comprises a main body 11 in which a main body flow path 13 connecting a fluid inlet 13i to a fluid outlet 13o is formed, a control valve 12 provided in the main body flow path, an orifice part 14 provided downstream of the control valve, and a pressure sensor 16 for measuring the pressure between the control valve and the orifice part; a gas source 2 that supplies gas to the flow rate control device; and an exhaust path 4 branching at a branch point A on the gas supply path between the gas source and the flow rate control device. A first valve V1 is disposed in a gas supply path 3 upstream of the branch point, and a second valve V2 is disposed in the exhaust path. When the flow rate control device switches from controlling a first flow rate to controlling a second flow rate, the first valve V1 is closed and the second valve V2 is opened with the control valve 12 being open, thereby discharging the gas retained between the control valve and the orifice part via the exhaust path 4.

NISHINO KOUJI (JP)
HIRATA KAORU (JP)
SUGITA KATSUYUKI (JP)
OGAWA SHINYA (JP)
IDEGUCHI KEISUKE (JP)
IKEDA NOBUKAZU (JP)
SAWACHI ATSUSHI (JP)

PCT/JP2023/010113

September 28, 2023

March 15, 2023

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FUJIKIN KK (JP)
TOKYO ELECTRON LTD (JP)

G05D7/06

WO2015064035A1	2015-05-07
WO2015111391A1	2015-07-30

JP2017011055A	2017-01-12
JP2013231460A	2013-11-14

TANIDA Ryuichi et al. (JP)

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