Title:
EXPOSING MASK AND PRODUCTION METOD THEREFOR AND EXPOSING METHOD
Document Type and Number:
WIPO Patent Application WO/2004/068241
Kind Code:
A1
Abstract:
An exposing mask capable of obtaining a sufficient gradient with a simple structure and forming a 3-D shape by exposing. An exposing mask (M) used in an exposure system (S), wherein a plurality of pattern blocks, each comprising a pair of a light shielding pattern for shielding light emitted from the exposure system (S) and a transmission pattern for transmitting this light, are continuously arranged, and they are provided at a constant pitch with a ratio between a light shielding pattern and a transmission pattern gradually varying.
Inventors:
OZAWA KEN (JP)
Application Number:
PCT/JP2004/000778
Publication Date:
August 12, 2004
Filing Date:
January 28, 2004
Export Citation:
Assignee:
SONY CORP (JP)
OZAWA KEN (JP)
OZAWA KEN (JP)
International Classes:
G02B3/00; G03F1/68; G02B5/00; G03F1/70; (IPC1-7): G03F1/08; G03F7/20
Foreign References:
| JPH07230159A | 1995-08-29 | |||
| US6335151B1 | 2002-01-01 | |||
| JP2001147515A | 2001-05-29 |
Other References:
See also references of EP 1589373A4
Attorney, Agent or Firm:
Nakamura, Tomoyuki c/o Miyoshi International Patent Office (Toranomon Kotohira Tower 2-8, Toranomon 1-chom, Minato-ku Tokyo, JP)
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