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Title:
EXPOSURE APPARATUS, LIQUID CRYSTAL DISPLAY DEVICE AND METHOD FOR MANUFACTURING SAME
Document Type and Number:
WIPO Patent Application WO/2012/102104
Kind Code:
A1
Abstract:
The present invention provides: an exposure apparatus which is capable of suppressing the formation of seams on a display screen even in cases where the alignment is carried out by scanning exposure; a liquid crystal display device; and a method for manufacturing the liquid crystal display device. The present invention is an exposure apparatus which exposes an optical alignment film, while relatively moving a substrate, on the surface of which the optical alignment film is provided, with respect to exposure light. The exposure apparatus performs a first exposure, in which a first portion and a second portion of the optical alignment film are exposed, and a second exposure, in which a third portion of the optical alignment film is exposed and the second portion thereof is exposed again. The second portion lies between the first portion and the third portion. The first exposure is carried out so that the irradiance in the second portion is lower than the irradiance in the first portion, and the second exposure is carried out so that the irradiance in the second portion is lower than the irradiance in the third portion. The total of the irradiance in the second portion by the first exposure and the irradiance in the second portion by the second exposure is set to be lower than the irradiance in the first portion and the irradiance in the third portion.

Inventors:
INOUE IICHIRO
MIYACHI KOICHI
Application Number:
PCT/JP2012/050662
Publication Date:
August 02, 2012
Filing Date:
January 16, 2012
Export Citation:
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Assignee:
SHARP KK (JP)
INOUE IICHIRO
MIYACHI KOICHI
International Classes:
G02F1/1337
Domestic Patent References:
WO2007086474A12007-08-02
WO2008069181A12008-06-12
Attorney, Agent or Firm:
YASUTOMI & Associates (JP)
Patent business corporation Yasutomi international patent firm (JP)
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