Title:
EXPOSURE APPARATUS, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD
Document Type and Number:
WIPO Patent Application WO/2011/024866
Kind Code:
A1
Abstract:
Disclosed is an exposure apparatus which exposes a substrate. The exposure apparatus is provided with: a stage which has a placing section having the substrate placed thereon and moves; a detection unit, which is provided on the stage, and detects the substrate portion at a position in a predetermined region of the placing section; and a control unit which drive-controls the stage, on the basis of the detection results obtained from the detection unit.
Inventors:
KATO MASAKI (JP)
NARA KEI (JP)
NARA KEI (JP)
Application Number:
PCT/JP2010/064405
Publication Date:
March 03, 2011
Filing Date:
August 25, 2010
Export Citation:
Assignee:
NIKON CORP (JP)
KATO MASAKI (JP)
NARA KEI (JP)
KATO MASAKI (JP)
NARA KEI (JP)
International Classes:
G03F9/00; H01L21/027
Foreign References:
| JP2009014919A | 2009-01-22 | |||
| JP2008191303A | 2008-08-21 | |||
| JP2006139087A | 2006-06-01 | |||
| JPH1064979A | 1998-03-06 | |||
| JPH01164032A | 1989-06-28 | |||
| JP2000246880A | 2000-09-12 | |||
| JP2008277478A | 2008-11-13 |
Attorney, Agent or Firm:
SHIGA Masatake et al. (JP)
Masatake Shiga (JP)
Masatake Shiga (JP)
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