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Title:
EXPOSURE APPARATUS AND METHOD FOR MANUFACTURING DEVICE
Document Type and Number:
WIPO Patent Application WO/2007/007746
Kind Code:
A1
Abstract:
Disclosed is an exposure apparatus (EX) comprising a first stage (WST) and a second stage (MST). A maintenance device (55) performs maintenance of the second stage (MST) during an exposure process of a wafer (W) held on the first stage.

Inventors:
MIZUTANI TAKEYUKI (JP)
OKUMURA MASAHIKO (JP)
KOHNO HIROTAKA (JP)
Application Number:
PCT/JP2006/313758
Publication Date:
January 18, 2007
Filing Date:
July 11, 2006
Export Citation:
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Assignee:
NIKON CORP (JP)
MIZUTANI TAKEYUKI (JP)
OKUMURA MASAHIKO (JP)
KOHNO HIROTAKA (JP)
International Classes:
H01L21/027; G03F7/20
Domestic Patent References:
WO1999060361A11999-11-25
WO2005122242A12005-12-22
Foreign References:
JP2004260115A2004-09-16
JP2001203140A2001-07-27
JPH1187237A1999-03-30
JP2006165502A2006-06-22
JP2004319891A2004-11-11
JP2003188096A2003-07-04
JP2005201582A2005-07-28
JPH07176468A1995-07-14
US5646413A1997-07-08
EP1079223A12001-02-28
JPS57117238A1982-07-21
US4465368A1984-08-14
JPH1116816A1999-01-22
US20020061469A12002-05-23
JPH10163099A1998-06-19
JPH10214783A1998-08-11
US6341007B12002-01-22
US6400441B12002-06-04
US6549269B12003-04-15
US6590634B12003-07-08
JP2000505958A2000-05-16
US5969441A1999-10-19
US6208407B12001-03-27
JP2004168481A2004-06-17
US6778257B22004-08-17
JP2004519850A2004-07-02
US6611316B22003-08-26
US5623853A1997-04-29
US5528118A1996-06-18
JPH08166475A1996-06-25
JPH08330224A1996-12-13
US5874820A1999-02-23
Other References:
See also references of EP 1909310A4
Attorney, Agent or Firm:
SHIGA, Masatake et al. (Yaesu Chuo-ku, Tokyo 53, JP)
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