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Title:
EXPOSURE APPARATUS, EXPOSURE METHOD, AND METHOD FOR MANUFACTURING DEVICE
Document Type and Number:
WIPO Patent Application WO/2018/198222
Kind Code:
A1
Abstract:
This exposure apparatus EX is provided with: a beam optical system (12) that is capable of irradiating an object (W) with a charged particle beam (EB (AX)); first magnetic field generating apparatuses (51Z) that generate a magnetic field having a first characteristic in a space (SP) between the beam optical system (12) and the object (W); and second magnetic field generating apparatuses (52X, 52Y) that generate a magnetic field having a second characteristic in the space between the beam optical system (12) and the object (W).

Inventors:
YAMAMOTO ATSUSHI (JP)
Application Number:
PCT/JP2017/016524
Publication Date:
November 01, 2018
Filing Date:
April 26, 2017
Export Citation:
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Assignee:
NIKON CORP (JP)
International Classes:
H01L21/027; G03F7/20
Domestic Patent References:
WO2009157054A12009-12-30
WO2011065240A12011-06-03
WO2010029725A12010-03-18
Foreign References:
JP2012009711A2012-01-12
JPH05182789A1993-07-23
JP2011243541A2011-12-01
JP2008053121A2008-03-06
JP2005252254A2005-09-15
JP2003068603A2003-03-07
JP2006287015A2006-10-19
JP2000357648A2000-12-26
JP2003332781A2003-11-21
Attorney, Agent or Firm:
EGAMI, Tatsuo (JP)
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