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Title:
EXPOSURE APPARATUS, EXPOSURE METHOD AND METHOD FOR MANUFACTURING MICRODEVICE
Document Type and Number:
WIPO Patent Application WO/2006/101086
Kind Code:
A1
Abstract:
In an exposure apparatus, a mask stage (MST) for placing a mask (M) and a substrate stage (PST) for placing a photosensitive substrate (P) are synchronously moved relatively to projection optical systems (PL1-PL11), and scanning exposure of a pattern of the mask (M) is performed to the photosensitive substrate (P). A position of the substrate stage (PST) to the projection optical systems (PL1-PL11) at the time of detecting alignment marks (a19-a24) arranged on the photosensitive substrate (P) substantially matches with a position of the substrate stage (PST) to the projection optical systems (PL1-PL11) at the time of starting the scanning exposure.

Inventors:
Yanagihara, Masamitsu c/o NIKON CORPORATION Intellectual Property Department (2-3 Marunouchi 3-chome Chiyoda-k, Tokyo 31, 10083, JP)
Koitabashi, Hideki c/o NIKON CORPORATION Intellectual Property Department (2-3 Marunouchi 3-chome Chiyoda-k, Tokyo 31, 10083, JP)
Application Number:
PCT/JP2006/305579
Publication Date:
September 28, 2006
Filing Date:
March 20, 2006
Export Citation:
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Assignee:
NIKON CORPORATION (2-3 Marunouchi 3-chome, Chiyoda-ku Tokyo, 31, 10083, JP)
Yanagihara, Masamitsu c/o NIKON CORPORATION Intellectual Property Department (2-3 Marunouchi 3-chome Chiyoda-k, Tokyo 31, 10083, JP)
Koitabashi, Hideki c/o NIKON CORPORATION Intellectual Property Department (2-3 Marunouchi 3-chome Chiyoda-k, Tokyo 31, 10083, JP)
International Classes:
G03F7/20; H01L21/027
Attorney, Agent or Firm:
Fujimoto, Yoshihiro (Verdy NOGIZAKA 2F, 14-7 Minamiaoyama 1-chome, Minato-k, Tokyo 62, 10700, JP)
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