Title:
EXPOSURE APPARATUS AND EXPOSURE METHOD
Document Type and Number:
WIPO Patent Application WO/2007/000921
Kind Code:
A1
Abstract:
An exposure apparatus and an exposure method that can reliably perform imaging
of an alignment mark of a photosensitive material placed on a stage. While the
stage having the photosensitive material placed on it is moved along a predetermined
conveyance route, a predetermined region including the alignment mark M of the
photosensitive material is imaged by a first camera, and the position of a second
camera having a higher magnification ratio than the first camera is adjusted
based on the result of imaging by the first camera. Further, while the stage is
moved along the predetermined conveyance route, the alignment mark M of the photosensitive
material is imaged by the second camera, and image data corrected based on the
imaging result is exposed on the photosensitive material by an exposure means.
Inventors:
FUKUI TAKASHI (JP)
UEMURA HIROSHI (JP)
UEMURA HIROSHI (JP)
Application Number:
PCT/JP2006/312401
Publication Date:
January 04, 2007
Filing Date:
June 21, 2006
Export Citation:
Assignee:
FUJI PHOTO FILM CO LTD (JP)
FUKUI TAKASHI (JP)
UEMURA HIROSHI (JP)
FUKUI TAKASHI (JP)
UEMURA HIROSHI (JP)
International Classes:
G03F9/00; G03F7/20
Foreign References:
| JP2004163814A | 2004-06-10 | |||
| JP2004056080A | 2004-02-19 | |||
| JP2004327660A | 2004-11-18 | |||
| JP2003347184A | 2003-12-05 | |||
| JP2005189365A | 2005-07-14 |
Attorney, Agent or Firm:
NAKAJIMA, Jun et al. (NAKAJIMA & KATO Seventh Floor, HK-Shinjuku-ku Bldg., 3-17, Shinjuku 4-chome, Shinjuku-k, Tokyo 22, JP)
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