Title:
EXPOSURE APPARATUS USING MICROLENS ARRAY THEREIN, AND OPTICAL MEMBER
Document Type and Number:
WIPO Patent Application WO/2012/029449
Kind Code:
A1
Abstract:
Provided is an exposure apparatus, which can prevent a foreign material from entering between a microlens array and a substrate, and which can also prevent a microlens from being scratched due to the foreign material and abnormal closeness of the substrate. Also provided is an optical member.
A microlens array (3) having a plurality of microlenses (3a) formed therein is disposed above a transparent substrate (1), and the microlens array (3) is bonded to a mask (4) on the end surface (6) of the microlens array. The mask (4) has alignment mark bases (12) bonded on both the sides of the microlens array (3), and alignment marks (11) are formed on the surfaces of the alignment mark bases (12), said surfaces facing the substrate (1). The interval between each of the alignment mark bases (12) and the substrate (1) is smaller than the interval between the microlens array (3) and the substrate (1).
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Inventors:
MIZUMURA MICHINOBU (JP)
ARAI TOSHINARI (JP)
ARAI TOSHINARI (JP)
Application Number:
PCT/JP2011/066994
Publication Date:
March 08, 2012
Filing Date:
July 26, 2011
Export Citation:
Assignee:
V TECHNOLOGY CO LTD (JP)
MIZUMURA MICHINOBU (JP)
ARAI TOSHINARI (JP)
MIZUMURA MICHINOBU (JP)
ARAI TOSHINARI (JP)
International Classes:
H01L21/027; G02B3/00; G03F9/00
Domestic Patent References:
| WO2010047362A1 | 2010-04-29 |
Foreign References:
| JP2009277900A | 2009-11-26 |
Attorney, Agent or Firm:
FUJIMAKI, MASANORI (JP)
Masanori Fujimaki (JP)
Masanori Fujimaki (JP)
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Claims: