Title:
EXPOSURE APPARATUS
Document Type and Number:
WIPO Patent Application WO/2011/068014
Kind Code:
A1
Abstract:
Disclosed is an exposure apparatus which is provided with: photomasks (10, 24), each of which has a mask pattern formed thereon, said mask pattern having the same shape as that of an exposure pattern to be exposed on the surface of a TFT substrate (4) held on a stage (8); lens assemblies (11, 25), which respectively have a plurality of unit lens groups (15, 29) disposed in planes parallel to the photomasks (10, 24) and the surface of the TFT substrate (4) held on the stage (8), said unit lens groups being configured by disposing a plurality of convex lenses (14, 28) in the normal line directions of the photomasks (10, 24), respectively, such that the same-magnification erected images of the mask patterns respectively formed on the photomasks (10, 24) can be formed on the surface of the TFT substrate (4); and moving means (12, 26), which move the lens assemblies (11, 25) in the planes parallel to the masks (10, 24) and the surface of the TFT substrate (4) on the stage (8).
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Inventors:
MIZUMURA MICHINOBU (JP)
HASHIMOTO KAZUSHIGE (JP)
HATANAKA MAKOTO (JP)
HASHIMOTO KAZUSHIGE (JP)
HATANAKA MAKOTO (JP)
Application Number:
PCT/JP2010/069974
Publication Date:
June 09, 2011
Filing Date:
November 10, 2010
Export Citation:
Assignee:
V TECHNOLOGY CO LTD (JP)
MIZUMURA MICHINOBU (JP)
HASHIMOTO KAZUSHIGE (JP)
HATANAKA MAKOTO (JP)
MIZUMURA MICHINOBU (JP)
HASHIMOTO KAZUSHIGE (JP)
HATANAKA MAKOTO (JP)
International Classes:
G03F7/20; H01L21/027
Foreign References:
| JP2009058666A | 2009-03-19 | |||
| JP2009277900A | 2009-11-26 | |||
| JP2008176257A | 2008-07-31 | |||
| JPH09244255A | 1997-09-19 |
Attorney, Agent or Firm:
SASAJIMA, Fujio et al. (JP)
Sasajima Wealth 2 male (JP)
Sasajima Wealth 2 male (JP)
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