Title:
EXPOSURE APPARATUS
Document Type and Number:
WIPO Patent Application WO/2015/016686
Kind Code:
A1
Abstract:
The present application relates to a photomask, and an exposure apparatus and method. According to the photomask and the exposure apparatus and method of the present application, a fine pattern of a sub-micrometer size can be easily formed on a cylindrical mold, and the cylindrical mold in which the pattern has been formed can be easily applied in an automated process such as a roll-to-roll process. Also, in the present application, a mask formed of a flexible material is used, and thus fine patterns can be formed as large areas of various sizes, and patterns of different shapes can be separately or independently formed on the curved surface of the cylindrical mold, and thus the invention shows an excellent effect in terms of the degree of freedom of processing.
Inventors:
PARK JEONG HO (KR)
SHIN BU GON (KR)
KIM JAE JIN (KR)
LEE JONG BYUNG (KR)
SHIN BU GON (KR)
KIM JAE JIN (KR)
LEE JONG BYUNG (KR)
Application Number:
PCT/KR2014/007147
Publication Date:
February 05, 2015
Filing Date:
August 01, 2014
Export Citation:
Assignee:
LG CHEMICAL LTD (KR)
International Classes:
H01L21/027; G03F1/22
Foreign References:
| US20130017499A1 | 2013-01-17 | |||
| KR20100028330A | 2010-03-12 | |||
| KR100817101B1 | 2008-03-26 | |||
| US20100197044A1 | 2010-08-05 | |||
| US20100264502A1 | 2010-10-21 |
Attorney, Agent or Firm:
DANA PATENT LAW FIRM (KR)
특허법인 다나 (KR)
특허법인 다나 (KR)
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