Title:
EXPOSURE CONTROL METHOD, APPARATUS AND MOVABLE PLATFORM
Document Type and Number:
WIPO Patent Application WO/2021/007690
Kind Code:
A1
Abstract:
The present invention provides an exposure control method, apparatus, and movable platform. In the present method, an image captured by an image capture apparatus is obtained, the image containing a first image region and a second image region, the first image region being a non-sky region, and the second image region being a sky region; the first image region from the image is extracted; an exposure parameter of the image capture apparatus is adjusted according to the brightness of the first image region and a preset target brightness. The technical solution provided by the embodiments of the present invention are able to solve, to a certain extent, the problem where existing exposure control methods can cause poor exposure, and the embodiments of the present invention also improve image quality.
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Inventors:
CAI JIANZHAO (CN)
ZHOU YOU (CN)
WEI SHENGHUA (CN)
ZHOU YOU (CN)
WEI SHENGHUA (CN)
Application Number:
PCT/CN2019/095732
Publication Date:
January 21, 2021
Filing Date:
July 12, 2019
Export Citation:
Assignee:
SZ DJI TECHNOLOGY CO LTD (CN)
International Classes:
H04N5/235
Foreign References:
| CN104917950A | 2015-09-16 | |||
| CN104050651A | 2014-09-17 | |||
| CN108335272A | 2018-07-27 | |||
| CN103826066A | 2014-05-28 | |||
| US20160125612A1 | 2016-05-05 |
Attorney, Agent or Firm:
LEADER PATENT & TRADEMARK FIRM (CN)
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