Title:
EXPOSURE DEVICE, EXPOSURE DEVICE CONTROL METHOD, AND DEVICE MANUFACTURING METHOD
Document Type and Number:
WIPO Patent Application WO/2017/099087
Kind Code:
A1
Abstract:
An exposure device (100) comprises: an irradiation device (30) that irradiates a target (W) with an electron beam; a stage (26) that retains the target; a stage drive system including an electromagnetic motor that drives the stage; and a control system that controls the stage drive system on the basis of the irradiation state of the electron beam on the target. The control system changes the content of control of the stage drive system during irradiation and during non-irradiation of the electron beam on the target. Due to this configuration, deviations in the irradiation position of the electron beam on the target can be suppressed when driving the stage using the electromagnetic motor as the drive source of the stage.
Inventors:
SHIBAZAKI YUICHI (JP)
Application Number:
PCT/JP2016/086272
Publication Date:
June 15, 2017
Filing Date:
December 06, 2016
Export Citation:
Assignee:
NIKON CORP (JP)
International Classes:
G03F7/20; G03F9/00; H01L21/68
Foreign References:
| JP2002126964A | 2002-05-08 | |||
| JP2014209521A | 2014-11-06 | |||
| JP2004134682A | 2004-04-30 | |||
| JP2011227768A | 2011-11-10 | |||
| JPH06140305A | 1994-05-20 | |||
| JPH11345764A | 1999-12-14 | |||
| JPH04123418A | 1992-04-23 | |||
| JPH10284387A | 1998-10-23 |
Attorney, Agent or Firm:
TATEISHI, Atsuji (JP)
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