Title:
EXPOSURE DEVICE AND METHOD FOR MANUFACTURING EXPOSED OBJECT
Document Type and Number:
WIPO Patent Application WO/2019/087497
Kind Code:
A1
Abstract:
This exposure device is provided with an optical system unit, a shaping unit, and a partition member. The optical system unit has an emission region from which light is emitted. The shaping unit has a shaping region to which a photosensitive material sensitive to the light emitted from the emission region is supplied. The partition member has translucence and is arranged at least between the emission region of the optical system unit and the shaping region. Thus, it becomes possible to suppress degradation of the performance of an optical system due to generation of a volatile component of the photosensitive material.
Inventors:
SATOU KEI (JP)
SUZUKI AKIRA (JP)
KAWANISHI HIDEKAZU (JP)
MITOMO JUGO (JP)
SUZUKI AKIRA (JP)
KAWANISHI HIDEKAZU (JP)
MITOMO JUGO (JP)
Application Number:
PCT/JP2018/029041
Publication Date:
May 09, 2019
Filing Date:
August 02, 2018
Export Citation:
Assignee:
SONY CORP (JP)
International Classes:
B29C64/268; B33Y10/00; B33Y30/00
Foreign References:
| JP2002067173A | 2002-03-05 | |||
| JP2007208028A | 2007-08-16 |
Attorney, Agent or Firm:
OMORI, Junichi (JP)
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