Title:
EXPOSURE DEVICE, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD
Document Type and Number:
WIPO Patent Application WO/2010/050240
Kind Code:
A1
Abstract:
An exposure device sequentially exposes each of multiple substrates included in a lot with exposure light through liquid. The exposure device is provided with a substrate holding member capable of moving to a position which can be irradiated with the exposure light while holding the substrate, and a liquid immersion member capable of holding the liquid between the substrate held by the substrate holding member and the liquid immersion member and forming a liquid immersion space in such a manner that the light path of the exposure light is filled with the liquid. Before the start of exposure of the first substrate in the lot, the exposure device forms a liquid immersion space between the liquid immersion member and a movable member different from the first substrate and cleans at least one of the liquid immersion member or the movable member.
More Like This:
| JP2000031032 | DEVICE MANUFACTURING EQUIPMENT |
| JP2002057147 | SUBSTRATE TREATMENT DEVICE |
| JP2001015415 | CHARGED PARTICLE BEAM TRANSFER APPARATUS OF REFLECTING TYPE |
Inventors:
NAKANO, Katsushi (2-3 Marunouchi 3-chome, Chiyoda-k, Tokyo 31, 〒1008331, JP)
中野勝志 (〒31 東京都千代田区丸の内３丁目２番３号 株式会社ニコン内 Tokyo, 〒1008331, JP)
SUGIMOTO, Munetaka (2-3 Marunouchi 3-chome, Chiyoda-k, Tokyo 31, 〒1008331, JP)
杉本宗毅 (〒31 東京都千代田区丸の内３丁目２番３号 株式会社ニコン内 Tokyo, 〒1008331, JP)
中野勝志 (〒31 東京都千代田区丸の内３丁目２番３号 株式会社ニコン内 Tokyo, 〒1008331, JP)
SUGIMOTO, Munetaka (2-3 Marunouchi 3-chome, Chiyoda-k, Tokyo 31, 〒1008331, JP)
杉本宗毅 (〒31 東京都千代田区丸の内３丁目２番３号 株式会社ニコン内 Tokyo, 〒1008331, JP)
Application Number:
JP2009/005803
Publication Date:
May 06, 2010
Filing Date:
October 30, 2009
Export Citation:
Assignee:
NIKON CORPORATION (2-3 Marunouchi 3-chome, Chiyoda-ku Tokyo, 31, 〒1008331, JP)
株式会社ニコン (〒31 東京都千代田区丸の内３丁目２番３号 Tokyo, 〒1008331, JP)
NAKANO, Katsushi (2-3 Marunouchi 3-chome, Chiyoda-k, Tokyo 31, 〒1008331, JP)
中野勝志 (〒31 東京都千代田区丸の内３丁目２番３号 株式会社ニコン内 Tokyo, 〒1008331, JP)
SUGIMOTO, Munetaka (2-3 Marunouchi 3-chome, Chiyoda-k, Tokyo 31, 〒1008331, JP)
株式会社ニコン (〒31 東京都千代田区丸の内３丁目２番３号 Tokyo, 〒1008331, JP)
NAKANO, Katsushi (2-3 Marunouchi 3-chome, Chiyoda-k, Tokyo 31, 〒1008331, JP)
中野勝志 (〒31 東京都千代田区丸の内３丁目２番３号 株式会社ニコン内 Tokyo, 〒1008331, JP)
SUGIMOTO, Munetaka (2-3 Marunouchi 3-chome, Chiyoda-k, Tokyo 31, 〒1008331, JP)
International Classes:
H01L21/027; G03F7/20
Attorney, Agent or Firm:
SHIGA, Masatake et al. (1-9-2, Marunouchi Chiyoda-k, Tokyo 20, 〒1006620, JP)
Download PDF: