Title:
EXPOSURE DEVICE AND METHOD FOR MANUFACTURING DEVICE
Document Type and Number:
WIPO Patent Application WO/2013/088551
Kind Code:
A1
Abstract:
The purpose of the present invention is to provide an exposure device which can reduce the occurrence of defects in pattern connections. An exposure device has a mask stage that moves while holding a mask, and a projection optical system for projecting an image of a mask pattern onto a substrate. The mask stage holds a plurality of masks such that the masks do not touch each other. A plurality of projection optical systems is provided. Each of the plurality of projection optical systems projects the pattern image of one mask from among the plurality of masks to the substrate. The substrate is exposed such that each exposure area on the substrate exposed by each projection optical system partially overlaps each other.
Inventors:
FUKUOKA RYOUSUKE (JP)
Application Number:
PCT/JP2011/079044
Publication Date:
June 20, 2013
Filing Date:
December 15, 2011
Export Citation:
Assignee:
CANON KK (JP)
FUKUOKA RYOUSUKE (JP)
FUKUOKA RYOUSUKE (JP)
International Classes:
G03F7/20
Foreign References:
| JP2010176121A | 2010-08-12 | |||
| JP2007201457A | 2007-08-09 |
Attorney, Agent or Firm:
ABE Takuma et al. (JP)
Takuma Abe (JP)
Takuma Abe (JP)
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Claims: