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Title:
EXPOSURE DEVICE, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD
Document Type and Number:
WIPO Patent Application WO/2018/173829
Kind Code:
A1
Abstract:
An exposure device EX is provided with: a beam optical system (12) capable of irradiating an object (W) with charged particle beams (EB); and a magnetic field generation device (54 (541)) that generates a magnetic field in a space between the beam optical system (12) and the object (W).

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Inventors:
YAMAMOTO, Atsushi (15-3 Konan 2-chome, Minato-k, Tokyo 90, 〒1086290, JP)
Application Number:
JP2018/009484
Publication Date:
September 27, 2018
Filing Date:
March 12, 2018
Export Citation:
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Assignee:
NIKON CORPORATION (15-3, Konan 2-chome Minato-k, Tokyo 90, 〒1086290, JP)
International Classes:
H01L21/027; G03F7/20; H01J37/305
Foreign References:
JPH10116764A1998-05-06
JPH0961385A1997-03-07
JP2000353487A2000-12-19
JP2003068603A2003-03-07
JPH021111A1990-01-05
JPH11250844A1999-09-17
JP2005252254A2005-09-15
JP2003037047A2003-02-07
JP2014209521A2014-11-06
JP2016046501A2016-04-04
JP2004327080A2004-11-18
JP2000133181A2000-05-12
JP2001126651A2001-05-11
JP2002324748A2002-11-08
JP2006019435A2006-01-19
EP2738607A12014-06-04
Attorney, Agent or Firm:
EGAMI, Tatsuo (3rd Floor Oak Building Kyobashi, 16-10, Kyobashi 1-chome, Chuou-k, Tokyo 31, 〒1040031, JP)
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