Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
EXPOSURE DEVICE, EXPOSURE METHOD, PRODUCTION METHOD FOR FLAT PANEL DISPLAY, AND DEVICE PRODUCTION METHOD
Document Type and Number:
WIPO Patent Application WO/2018/181476
Kind Code:
A1
Abstract:
An exposure device (1) comprising: a support device (14) that supports an optical system in an exposure device that irradiates illumination light (EL) on to an object (P) via the optical system (13), scans and exposes the object, and forms a prescribed pattern that a mask (M) has, on the object; and an object support unit (152) provided in the support device and supporting the object in a non-contact manner.

Inventors:
AOKI YASUO (JP)
TOMIE AKIHIKO (JP)
Application Number:
PCT/JP2018/012767
Publication Date:
October 04, 2018
Filing Date:
March 28, 2018
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
NIKON CORP (JP)
International Classes:
G03F7/20; H01L21/683
Foreign References:
JP2017062490A2017-03-30
JP2000182931A2000-06-30
JP2014036023A2014-02-24
JP2003045785A2003-02-14
Attorney, Agent or Firm:
EGAMI, Tatsuo (JP)
Download PDF:
View/Download PDF      PDF Help



 
Previous Patent: MASK-INTEGRATED SURFACE PROTECTIVE TAPE WITH RELEASE LINER

Next Patent: IN-CELL LIQUID CRYSTAL PANEL AND LIQUID CRYSTAL DISPLAY DEVICE