Title:
EXPOSURE DEVICE AND EXPOSURE METHOD
Document Type and Number:
WIPO Patent Application WO/2016/157697
Kind Code:
A1
Abstract:
Provided are an exposure device and an exposure method which allow high efficiency and extended lifespan of a spatial light modulator to be achieved. An exposure device (100) is provided with: a microlens array (142) where an array of microlenses for collecting light from a light source are disposed; a spatial light modulation element (digital micromirror device) (12) where pixels for modulating the light collected by the microlens array (142) are disposed; a first focusing optical system (143) for focusing the light collected by the microlens array (142) onto the spatial light modulation element (12); and a second focusing optical system (16) for focusing the light modulated by the spatial light modulation element (12) onto a photosensitive material.
Inventors:
OTSUKA AKIRA (JP)
Application Number:
PCT/JP2016/000908
Publication Date:
October 06, 2016
Filing Date:
February 19, 2016
Export Citation:
Assignee:
USHIO ELECTRIC INC (JP)
International Classes:
G03F7/20; G02B3/00; G02B19/00; G02B26/02
Domestic Patent References:
| WO2007040165A1 | 2007-04-12 | |||
| WO2008090942A1 | 2008-07-31 |
Foreign References:
| JP2005031280A | 2005-02-03 | |||
| JP2004126034A | 2004-04-22 | |||
| JP2006163339A | 2006-06-22 | |||
| JP2008197222A | 2008-08-28 | |||
| JP2013543647A | 2013-12-05 | |||
| JP2007094095A | 2007-04-12 | |||
| JP2004361939A | 2004-12-24 |
Attorney, Agent or Firm:
KONISHI, Kay et al. (JP)
Megumi Konishi (JP)
Megumi Konishi (JP)
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