Title:
EXPOSURE DEVICE AND EXPOSURE METHOD
Document Type and Number:
WIPO Patent Application WO/2019/216287
Kind Code:
A1
Abstract:
The present invention is characterized in that: a first photomask group is provided with a plurality of first photomasks, is set such that adjacent exposure regions of the first photomasks overlap each other, and has first gradation parts in which exposure of portions of two of the first photomasks corresponding to a first region where the exposure regions overlap each other can be performed in a mutually complementary manner; and a second photomask group is provided with a plurality of second photomasks, is set such that adjacent exposure regions of the second photomasks overlap each other, and has second gradation parts which in which exposure of portions of two of the second photomasks corresponding to a second region where the exposure regions overlap each other can be performed in a mutually complementary manner, wherein the first region and the second region are positioned so as not to overlap each other in the scanning direction.
Inventors:
ARAI TOSHINARI (JP)
Application Number:
PCT/JP2019/018070
Publication Date:
November 14, 2019
Filing Date:
April 26, 2019
Export Citation:
Assignee:
V TECH CO LTD (JP)
International Classes:
G03F7/20; G02F1/13; G02F1/1337
Domestic Patent References:
| WO2011089772A1 | 2011-07-28 | |||
| WO2012105393A1 | 2012-08-09 |
Foreign References:
| JP2014016380A | 2014-01-30 | |||
| JP2010117734A | 2010-05-27 | |||
| JP2013068764A | 2013-04-18 |
Attorney, Agent or Firm:
NISSAY INTERNATIONAL PATENT OFFICE (JP)
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