Title:
EXPOSURE DEVICE
Document Type and Number:
WIPO Patent Application WO/2014/185232
Kind Code:
A1
Abstract:
This exposure device (1) is provided with: support units (2S, 3S) which respectively support a mask (2) and a substrate (3) which has nonuniform thickness in the axial direction, a scanning exposure means (10) which moves a microlens array (12), arranged between the mask (2) and the substrate (3), relative to the substrate (3) and the mask (2), forms an image of part of the mask pattern on the partial exposure region (Ep), and scans the partial exposure region (Ep) along the axial direction; a mask/substrate gap adjusting means (20) which adjusts the gap (s) between the mask (2) and the substrate (3); and a mask/substrate gap measuring means (30) which measures the gap in the axial direction prior to scanning the partial exposure region (Ep). This exposure device (1) controls the mask/substrate gap adjusting means (20) on the basis of the measurement result of the mask/substrate gap measuring means (30) and the scan position of the scanning exposure means (10), and matches the gap (s) in the partial exposure region (Ep) to the image forming distance of the microlens array (12).
Inventors:
MIZUMURA MICHINOBU (JP)
Application Number:
PCT/JP2014/061382
Publication Date:
November 20, 2014
Filing Date:
April 23, 2014
Export Citation:
Assignee:
V TECHNOLOGY CO LTD (JP)
International Classes:
G03F7/207; G01B11/14; H01L21/027
Foreign References:
| JP2013057894A | 2013-03-28 | |||
| JP2004184994A | 2004-07-02 | |||
| JP2002043218A | 2002-02-08 | |||
| JP2006337999A | 2006-12-14 | |||
| JP2007078764A | 2007-03-29 | |||
| JP2012199553A | 2012-10-18 |
Attorney, Agent or Firm:
EICHI Patent & Trademark Corp. et al. (JP)
Patent business corporation Wisdom international patent firm (JP)
Patent business corporation Wisdom international patent firm (JP)
Download PDF:
Previous Patent: SIGNAL TRANSMISSION CABLE AND COMMUNICATION DEVICE MODULE
Next Patent: CAPACITANCE SENSOR
Next Patent: CAPACITANCE SENSOR