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Patent Searching and Data


Title:
EXPOSURE DEVICE
Document Type and Number:
WIPO Patent Application WO/2018/189817
Kind Code:
A1
Abstract:
Disclosed is a multi-beam exposure device in which fluctuations in optical systems of electronic beams are reduced, and in which vacuum leakage is prevented. Provided is an exposure device comprising: a barrel that is decompressed such that the interior thereof reaches a vacuum state; a plurality of charged particle beam sources that are provided inside the barrel and that respectively emit a plurality of charged particle beams in an extending direction of the barrel; a plurality of electromagnetic optical elements that are provided inside the barrel so as to correspond respectively to the plurality of charged particle beams, the electromagnetic optical elements respectively controlling the charged particle beams; a first partitioning wall and a second partitioning wall that are arranged inside the barrel so as to be separated from one another in the extending direction, and that form a non-vacuum space in at least a portion therebetween; and a support part that is provided inside the barrel and that supports and positions the plurality of electromagnetic optical elements.

Inventors:
SHIMIZU YOUICHI (JP)
TANAKA HITOSHI (JP)
Application Number:
PCT/JP2017/014880
Publication Date:
October 18, 2018
Filing Date:
April 11, 2017
Export Citation:
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Assignee:
ADVANTEST CORP (JP)
International Classes:
H01L21/027; G03F7/20; H01J37/305
Domestic Patent References:
WO2009157054A12009-12-30
Foreign References:
JP2006510184A2006-03-23
JP2012151102A2012-08-09
JP2013546152A2013-12-26
Attorney, Agent or Firm:
RYUKA IP LAW FIRM (JP)
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