Title:
EXPOSURE DEVICE
Document Type and Number:
WIPO Patent Application WO/2020/145044
Kind Code:
A1
Abstract:
Some photosensitive materials are likely to exhibit reduction in effective sensitization amount when exposure is performed in a temporally divided manner as compared to when exposure is performed in a temporally continuous manner. Performing interval exposure by using such materials leads to a problem of different effective sensitization amounts between overlapped parts and non-overlapped parts, resulting in changes in line width and thickness of transferred patterns. This problem is solved by this exposure device which is configured to perform scanning exposure on a to-be-exposed substrate by overlapping a plurality of scanning exposure view fields of a projection optical system, wherein an illumination optical system or a projection optical system is provided with a lighting intensity varying member (10c1, 10c2) that sets the exposure amount in a non-overlap part, which is to be exposed without overlap on the to-be-exposed substrate, to a level lower than the exposure amount in an overlapped part, which is to be exposed with an overlap on the to-be-exposed substrate.
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Inventors:
YOSHIDA RYOHEI (JP)
IDA MASATAKA (JP)
YOSHIDA DAISUKE (JP)
NOJIMA TAKUMI (JP)
MATSUHASHI YUSUKE (JP)
WATANABE NOBUAKI (JP)
IDA MASATAKA (JP)
YOSHIDA DAISUKE (JP)
NOJIMA TAKUMI (JP)
MATSUHASHI YUSUKE (JP)
WATANABE NOBUAKI (JP)
Application Number:
PCT/JP2019/049137
Publication Date:
July 16, 2020
Filing Date:
December 16, 2019
Export Citation:
Assignee:
NIKON CORP (JP)
International Classes:
G03F7/20
Foreign References:
| JP2002258489A | 2002-09-11 | |||
| JP2016024257A | 2016-02-08 | |||
| JP2001297975A | 2001-10-26 | |||
| JP2001060546A | 2001-03-06 | |||
| JP2019028084A | 2019-02-21 |
Attorney, Agent or Firm:
NAGAI, Fuyuki et al. (JP)
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