Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
EXPOSURE EQUIPMENT AND DEVICE MANUFACTURING METHOD
Document Type and Number:
WIPO Patent Application WO/2006/006565
Kind Code:
A1
Abstract:
Exposure equipment which can prevent a damage due to a flowed out liquid from expanding and highly perform exposure process and measuring process. Exposure equipment (EX) is provided with a movable table (PT), a base member (41) having an upper plane (41A) for guiding movement of the table (PT), and a detecting device (60) for detecting whether there is a liquid (LQ) on the upper plane (41A) of the base member (41) or not.

Inventors:
Shibuta, Makoto c/o NIKON CORPORATION (2-3 Marunouchi 3-chome, Chiyoda-k, Tokyo 31, 10083, JP)
Application Number:
PCT/JP2005/012776
Publication Date:
January 19, 2006
Filing Date:
July 11, 2005
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
NIKON CORPORATION (2-3 Marunouchi 3-chome, Chiyoda-ku Tokyo, 31, 10083, JP)
Shibuta, Makoto c/o NIKON CORPORATION (2-3 Marunouchi 3-chome, Chiyoda-k, Tokyo 31, 10083, JP)
International Classes:
H01L21/027; G03F7/20
Domestic Patent References:
WO1999049504A11999-09-30
Foreign References:
JPH10335235A1998-12-18
JP2005259789A2005-09-22
JP2005268700A2005-09-29
JP2005184004A2005-07-07
US5610683A1997-03-11
EP1528431A22005-05-04
Other References:
See also references of EP 1780772A4
Attorney, Agent or Firm:
Shiga, Masatake (2-3-1, Yaesu Chuo-k, Tokyo 53, 10484, JP)
Download PDF: