Title:
EXPOSURE EQUIPMENT AND DEVICE MANUFACTURING METHOD
Document Type and Number:
WIPO Patent Application WO/2006/006565
Kind Code:
A1
Abstract:
Exposure equipment which can prevent a damage due to a flowed out liquid from expanding and highly perform exposure process and measuring process. Exposure equipment (EX) is provided with a movable table (PT), a base member (41) having an upper plane (41A) for guiding movement of the table (PT), and a detecting device (60) for detecting whether there is a liquid (LQ) on the upper plane (41A) of the base member (41) or not.
Inventors:
SHIBUTA MAKOTO (JP)
Application Number:
PCT/JP2005/012776
Publication Date:
January 19, 2006
Filing Date:
July 11, 2005
Export Citation:
Assignee:
NIKON CORP (JP)
SHIBUTA MAKOTO (JP)
SHIBUTA MAKOTO (JP)
International Classes:
H01L21/027; G03F7/20
Domestic Patent References:
| WO1999049504A1 | 1999-09-30 |
Foreign References:
| JPH10335235A | 1998-12-18 | |||
| JP2005259789A | 2005-09-22 | |||
| JP2005268700A | 2005-09-29 | |||
| JP2005184004A | 2005-07-07 | |||
| US5610683A | 1997-03-11 | |||
| EP1528431A2 | 2005-05-04 |
Other References:
See also references of EP 1780772A4
Attorney, Agent or Firm:
Shiga, Masatake (Yaesu Chuo-k, Tokyo 53, JP)
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