EXPOSURE EQUIPMENT, EXPOSURE METHOD AND DEVICE MANUFACTURING METHOD

Title:

EXPOSURE EQUIPMENT, EXPOSURE METHOD AND DEVICE MANUFACTURING METHOD

Document Type and Number:

WIPO Patent Application WO/2005/122221

Kind Code:

A1

Abstract:

Exposure equipment (EX) exposes a board (P) by irradiating the board (P) with exposure light (EL) through a projection optical system (PL) and a liquid (LQ). The exposure equipment (EX) is provided with a liquid immersion mechanism (1) for supplying the liquid (LQ) and recovering the liquid (LQ). The liquid immersion mechanism (1) has an inclined plane (2), which faces the front plane of the board (P) and is inclined against the front plane of the board (P), and a liquid recovering port (22) of the liquid immersion mechanism (1) is formed on the inclined plane (2). A flat part (75) is provided between the board (P) and the projection optical system (PL). A liquid immersion area can be maintained small.

Inventors:

NAGASAKA HIROYUKI (JP)
OKUYAMA TAKESHI (JP)

Application Number:

PCT/JP2005/010576

Publication Date:

December 22, 2005

Filing Date:

June 09, 2005

Export Citation:

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Assignee:

NIKON CORP (JP)
NIKON ENGINEERING CO LTD (JP)
NAGASAKA HIROYUKI (JP)
OKUYAMA TAKESHI (JP)

International Classes:

G03F7/20; H01L21/027; (IPC1-7): H01L21/027; G03F7/20

Foreign References:

JP2005175176A	2005-06-30
EP1491957A2	2004-12-29
EP1489462A2	2004-12-22
EP1486827A2	2004-12-15
JP2004320017A	2004-11-11
EP1528433A2	2005-05-04
JP2004320016A	2004-11-11

Other References: