Title:
EXPOSURE METHOD, EXPOSURE APPARATUS AND CLEANING METHOD
Document Type and Number:
WIPO Patent Application WO/2012/011512
Kind Code:
A1
Abstract:
[Problem] To provide an exposure method wherein a region that is in contact with a liquid and has a water repellent film is cleaned in a liquid immersion exposure apparatus.
[Solution] A method for exposing a substrate by irradiating the substrate with exposure light through a liquid using a liquid immersion exposure apparatus which has a water repellent film in at least a part of a region that is in contact with the liquid. The method for exposing a substrate comprises: a measurement step wherein measurement is carried out through the liquid in at least a part of the region having the water repellent film; and an exposure step wherein the substrate is irradiated with exposure light through the liquid. The redox potential of the liquid is controlled to a predetermined value in the measurement step and/or the exposure step.
Inventors:
TANI, Yasuhisa (12-1 Yurakucho 1-chome, Chiyoda-k, Tokyo 31, 〒1008331, JP)
Application Number:
JP2011/066498
Publication Date:
January 26, 2012
Filing Date:
July 20, 2011
Export Citation:
Assignee:
NIKON CORPORATION (12-1, Yurakucho 1-chome Chiyoda-k, Tokyo 31, 〒1008331, JP)
株式会社ニコン (〒31 東京都千代田区有楽町一丁目１２番１号 Tokyo, 〒1008331, JP)
株式会社ニコン (〒31 東京都千代田区有楽町一丁目１２番１号 Tokyo, 〒1008331, JP)
International Classes:
H01L21/027
Attorney, Agent or Firm:
KAWAKITA, Kijuro (YKB Mike Garden, 5-4 Shinjuku 1-chome, Shinjuku-k, Tokyo 22, 〒1600022, JP)
Claims:
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