Title:
EXPOSURE METHOD, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD
Document Type and Number:
WIPO Patent Application WO/2012/137866
Kind Code:
A1
Abstract:
An exposure method for exposing a substrate to exposure light, which includes: obtaining information pertaining to the deformation of a first portion of the outer edge region of the substrate which includes the edge; obtaining, on the basis of the obtained information and a prescribed relational expression, information pertaining to the deformation of a second portion of the outer edge region differing from the first portion; and exposure of the substrate on the basis of the obtained information pertaining to the deformation of the first portion and the second portion.
Inventors:
SHINOZAKI TADAAKI (JP)
NAKAMURA NOBUTAKA (JP)
NAKAMURA NOBUTAKA (JP)
Application Number:
PCT/JP2012/059354
Publication Date:
October 11, 2012
Filing Date:
April 05, 2012
Export Citation:
Assignee:
NIKON CORP (JP)
SHINOZAKI TADAAKI (JP)
NAKAMURA NOBUTAKA (JP)
SHINOZAKI TADAAKI (JP)
NAKAMURA NOBUTAKA (JP)
International Classes:
G03F9/00; H01L21/027
Domestic Patent References:
| WO2011087129A1 | 2011-07-21 |
Foreign References:
| JP2010243823A | 2010-10-28 | |||
| JP2008003441A | 2008-01-10 | |||
| JP2006285144A | 2006-10-19 | |||
| JP2010122526A | 2010-06-03 |
Attorney, Agent or Firm:
SHIGA Masatake et al. (JP)
Masatake Shiga (JP)
Masatake Shiga (JP)
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Claims:
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