Title:
EXPOSURE METHOD AND APPARATUS
Document Type and Number:
WIPO Patent Application WO2002088843
Kind Code:
A3
Abstract:
An exposure method comprising the steps of forming onto a mask that arranges a pattern of a contact hole and a plurality of patterns each being smaller than the contact hole pattern, and illuminating the mask using plural kinds of light so as to resolve the desired pattern without the smaller patterns on a target via a projection optical system.
Inventors:
SAITOH KENJI
SUZUKI AKIYOSHI
YAMAZOE KENJI
SUZUKI AKIYOSHI
YAMAZOE KENJI
Application Number:
PCT/JP2002/004082
Publication Date:
July 10, 2003
Filing Date:
April 24, 2002
Export Citation:
Assignee:
CANON KK (JP)
International Classes:
G03F1/00; G03F7/20; (IPC1-7): G03F7/20; G03F1/00
Foreign References:
| US5447810A | 1995-09-05 | |||
| EP0969327A1 | ||||
| US5298365A | 1994-03-29 | |||
| US6150059A | 2000-11-21 | |||
| EP0464492A1 | 1992-01-08 |
Other References:
PATENT ABSTRACTS OF JAPAN vol. 018, no. 672 (E - 1646) 19 December 1994 (1994-12-19)
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