Title:
EXPOSURE METHOD, EXPOSURE DEVICE, AND MANUFACTURING METHOD FOR DEVICE
Document Type and Number:
WIPO Patent Application WO/2011/087129
Kind Code:
A1
Abstract:
Disclosed is an exposure method in which: the relationship is derived between a first component of a non-linear distortion generated on a first substrate, said first component being calculated by measuring a first number of alignment marks, and a second component which can be calculated by measuring a second number of alignment marks which is lower than the first number of alignment marks measured; the second number of alignment marks on a second substrate is measured; deformation information for the second substrate is obtained on the basis of the result of the measurement of the second number of alignment marks and the derived relationship between the first component and the second component; and the second substrate is exposed to an exposure beam on the basis of the obtained deformation information.
More Like This:
| JP2005031218 | SURFACE LIGHT SOURCE APPARATUS FOR IMAGE RECOGNITION |
| JPS5872944 | MASK FOR PHOTOETCHING |
| JPS5165882 | FUOTOREJISUTONO TOFUHOHO |
Inventors:
KITO YOSHIAKI (JP)
Application Number:
PCT/JP2011/050744
Publication Date:
July 21, 2011
Filing Date:
January 18, 2011
Export Citation:
Assignee:
NIKON CORP (JP)
KITO YOSHIAKI (JP)
KITO YOSHIAKI (JP)
International Classes:
G03F9/00; G01B11/16; H01L21/027
Domestic Patent References:
| WO2005083756A1 | 2005-09-09 |
Foreign References:
| JP2010186918A | 2010-08-26 | |||
| JP2001345243A | 2001-12-14 | |||
| JP2009206143A | 2009-09-10 | |||
| JP2003086483A | 2003-03-20 | |||
| JP2001215718A | 2001-08-10 |
Attorney, Agent or Firm:
SHIGA Masatake et al. (JP)
Masatake Shiga (JP)
Masatake Shiga (JP)
Download PDF:
Claims:
Previous Patent: BATTERY SYSTEM
Next Patent: ACETYLENE COMPOUND AND ORGANIC SEMICONDUCTOR MATERIAL COMPRISING SAME
Next Patent: ACETYLENE COMPOUND AND ORGANIC SEMICONDUCTOR MATERIAL COMPRISING SAME