Title:
EXPOSURE METHOD, EXPOSURE DEVICE, AND PRODUCTION METHOD FOR OPTICAL ANISOTROPIC LAYER
Document Type and Number:
WIPO Patent Application WO/2023/085308
Kind Code:
A1
Abstract:
Provided are: an exposure method and exposure device that can obtain an optical alignment film that has high alignment pattern precision; and a method for producing an optical anisotropic layer. The exposure method condenses linearly polarized light into a ring shape by using an optical member and exposes a film that has a compound that has a photo-alignment group. The exposure method has an exposure step in which the film and the optical member are relatively moved in the optical axis direction, while rotating the polarization direction of the linearly polarized light.
Inventors:
ANDO HIROTOSHI (JP)
HARASAWA TAKEHIKO (JP)
NAGANO SATOSHI (JP)
SEKIZAWA YASUHIRO (JP)
HARASAWA TAKEHIKO (JP)
NAGANO SATOSHI (JP)
SEKIZAWA YASUHIRO (JP)
Application Number:
PCT/JP2022/041684
Publication Date:
May 19, 2023
Filing Date:
November 09, 2022
Export Citation:
Assignee:
FUJIFILM CORP (JP)
International Classes:
G02B5/30; G02F1/1337; G03F7/20
Domestic Patent References:
| WO2016183602A1 | 2016-11-24 | |||
| WO2020066429A1 | 2020-04-02 | |||
| WO2020022513A1 | 2020-01-30 |
Foreign References:
| JP2008233903A | 2008-10-02 | |||
| JP2015532468A | 2015-11-09 |
Attorney, Agent or Firm:
ITOH Hideaki et al. (JP)
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