Title:
EXPOSURE METHOD, AND EXPOSURE DEVICE
Document Type and Number:
WIPO Patent Application WO/2011/077697
Kind Code:
A1
Abstract:
Provided are an exposure device and an exposure method wherein it is possible to create a color filter which has no defects even if the positional deviation in the substrate transfer direction is large. The exposure method involves arranging a substrate (202), which is coated with a resist, and a photomask (102) in a manner such that the substrate (202) and the photomask (102) face a blinking light source which repeatedly turns on and off. While continuously transferring the substrate (202) in the direction which is perpendicular to the arrangement direction of the openings (112) disposed on the photomask (102), the blinking light source turns on and off, thereby intermittently exposing the substrate (202) to light multiple times. During each exposure, the transfer speed of the substrate (202) is controlled in a manner such that the openings (112) of the photomask (102) overlap with a portion of the previous exposure patterns (122), thereby forming a stripe-shaped colored layer (802) which extends in the transfer direction of the substrate (202).
Inventors:
MATSUI KOHEI
HATTA KAORU
HATTA KAORU
Application Number:
PCT/JP2010/007380
Publication Date:
June 30, 2011
Filing Date:
December 20, 2010
Export Citation:
Assignee:
TOPPAN PRINTING CO LTD (JP)
MATSUI KOHEI
HATTA KAORU
MATSUI KOHEI
HATTA KAORU
International Classes:
G03F7/22; G02B5/20; G02F1/13; G02F1/1335; H01L21/027
Foreign References:
| JP2009216762A | 2009-09-24 | |||
| JP2009075529A | 2009-04-09 | |||
| JP2008216593A | 2008-09-18 | |||
| JP2007121344A | 2007-05-17 |
Attorney, Agent or Firm:
OGASAWARA, Shiro (JP)
Shiro Ogasawara (JP)
Shiro Ogasawara (JP)
Download PDF:
Previous Patent: ACTION ANALYSIS DEVICE AND ACTION ANALYSIS METHOD
Next Patent: DIE FOR MANUFACTURING A COMPOSITE MATERIAL STRUCTURE
Next Patent: DIE FOR MANUFACTURING A COMPOSITE MATERIAL STRUCTURE