Title:
EXPOSURE METHOD AND EXPOSURE DEVICE
Document Type and Number:
WIPO Patent Application WO/2011/125401
Kind Code:
A1
Abstract:
Disclosed is an exposure method for sequentially exposing a predetermined pattern onto a pattern forming area of a substrate through a photomask while moving the substrate in a prescribed direction, said exposure method comprising: a step for forming an alignment mark by irradiating laser light onto an area outside the pattern forming area in a direction that crosses the substrate moving direction and denting a certain shape into the surface of the substrate, while exposing the pattern onto the substrate; a step for detecting misalignment of the alignment mark in the direction that crosses the substrate moving direction, with respect to a prescribed reference position in the rear of the substrate moving direction; a step for moving the substrate and the photomask relative to each other so as to correct the aforementioned misalignment; and a step for exposing the next pattern at the succeeding position of the pattern. Hereby, a pattern can be exposed onto a larger unpatterned substrate with great accuracy and at low cost.
Inventors:
KAJIYAMA KOICHI (JP)
MIZUMURA MICHINOBU (JP)
MIZUMURA MICHINOBU (JP)
Application Number:
PCT/JP2011/054931
Publication Date:
October 13, 2011
Filing Date:
March 03, 2011
Export Citation:
Assignee:
V TECHNOLOGY CO LTD (JP)
KAJIYAMA KOICHI (JP)
MIZUMURA MICHINOBU (JP)
KAJIYAMA KOICHI (JP)
MIZUMURA MICHINOBU (JP)
International Classes:
G03F9/00; G03F7/20; G03F7/22; H01L21/027
Foreign References:
| JP2009216861A | 2009-09-24 | |||
| JP2001060008A | 2001-03-06 | |||
| JPH04288816A | 1992-10-13 | |||
| JP2009003159A | 2009-01-08 | |||
| JP2009265313A | 2009-11-12 | |||
| JP2009058666A | 2009-03-19 | |||
| JP2008233638A | 2008-10-02 |
Attorney, Agent or Firm:
SASAJIMA, Fujio et al. (JP)
Sasajima Wealth 2 male (JP)
Sasajima Wealth 2 male (JP)
Download PDF:
Claims: