Title:
EXPOSURE METHOD AND SYSTEM, AND METHOD FOR FABRICATING DEVICE
Document Type and Number:
WIPO Patent Application WO/2006/085626
Kind Code:
A1
Abstract:
An exposure system for enhancing line width uniformity of a pattern image being exposed onto an object such as a substrate. In the exposure system for exposing a wafer (121) with illumination light (IL) from a light source (101) through a reticle (119) and a projection optical system (120), a digital micromirror device (128) as a reflection element array including a plurality of mirror elements capable of respectively controlling the reflecting direction of the illumination light (IL) is arranged at a position substantially conjugate to the reticle (119) in an illumination optical system for illuminating the reticle (119) with the illumination light (IL), and illuminance distribution in the illumination region on the reticle (119) is controlled by controlling the reflection angle of each mirror element of the digital micromirror device (128) independently.
Inventors:
MOTEGI KIYOSHI (JP)
Application Number:
PCT/JP2006/302389
Publication Date:
August 17, 2006
Filing Date:
February 10, 2006
Export Citation:
Assignee:
NIKON CORP (JP)
MOTEGI KIYOSHI (JP)
MOTEGI KIYOSHI (JP)
International Classes:
H01L21/027; G02B26/08; G03F7/20
Foreign References:
| JP2004304135A | 2004-10-28 | |||
| JPH08313842A | 1996-11-29 | |||
| JP2004303951A | 2004-10-28 | |||
| JPH0113849A | ||||
| JPH1022209A | 1998-01-23 |
Attorney, Agent or Firm:
Omori, Satoshi (2075-2-501 Noborit, Tama-ku Kawasaki-shi Kanagawa 14, JP)
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