Title:
EXPOSURE PARAMETER ADJUSTMENT METHOD AND APPARATUS
Document Type and Number:
WIPO Patent Application WO/2022/105381
Kind Code:
A1
Abstract:
Provided are an exposure parameter adjustment method and apparatus. The method comprises: acquiring a first image photographed by a camera apparatus; determining a target light source, acquiring first position information of the target light source, and predicting, according to the first position information of the target light source, second position information of the target light source in a second image to be photographed by the camera apparatus at a second moment; and generating a predicted image of the second image according to the first image and the second position information, and adjusting an exposure parameter of the camera apparatus by means of a grayscale value of the first image and a grayscale value of the predicted image. According to the present method, the impact of the position of the target light source on the camera apparatus is determined by means of predicting the position of the target light source. When facing a scenario in which light rays dramatically change, the exposure parameter can be adjusted in a timely manner so as to obtain a clear image.
Inventors:
LIN PEILANG (CN)
JIANG YI (CN)
YU BENDE (CN)
JIANG YI (CN)
YU BENDE (CN)
Application Number:
PCT/CN2021/117598
Publication Date:
May 27, 2022
Filing Date:
September 10, 2021
Export Citation:
Assignee:
HUAWEI TECH CO LTD (CN)
International Classes:
H04N5/235
Foreign References:
| CN109624666A | 2019-04-16 | |||
| CN111448529A | 2020-07-24 | |||
| CN111246091A | 2020-06-05 | |||
| CN111460865A | 2020-07-28 | |||
| CN103196550A | 2013-07-10 | |||
| EP1914115A2 | 2008-04-23 |
Attorney, Agent or Firm:
TDIP & PARTNERS (CN)
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