Title:
EXPOSURE PATTERN, EXPOSURE MASK USED FOR FORMING SAME, AND METHOD FOR FORMING EXPOSURE PATTERN USING SAME
Document Type and Number:
WIPO Patent Application WO/2021/241877
Kind Code:
A1
Abstract:
The present invention relates to an exposure pattern, an exposure mask, and a method for forming an exposure pattern by same, wherein the exposure pattern is formed by division exposure, and in an area where a first exposure area formed by primary exposure overlaps a second exposure area formed by secondary exposure, the area of a first unit pattern region constituting the first exposure area is different from the area of a second unit pattern region constituting the second exposure area.
Inventors:
LEE JUN-GU (KR)
KIM JUN-HA (KR)
SON DONG-JIN (KR)
JANG MIN-SEOK (KR)
KIM JUN-HA (KR)
SON DONG-JIN (KR)
JANG MIN-SEOK (KR)
Application Number:
PCT/KR2021/004272
Publication Date:
December 02, 2021
Filing Date:
April 06, 2021
Export Citation:
Assignee:
DONGWOO FINE CHEM CO LTD (KR)
International Classes:
H01L21/027; G03F1/38; H01L27/12
Foreign References:
| KR20190087700A | 2019-07-25 | |||
| US20190164899A1 | 2019-05-30 | |||
| KR20120102113A | 2012-09-17 | |||
| US20190155144A1 | 2019-05-23 | |||
| US20160048015A1 | 2016-02-18 |
Attorney, Agent or Firm:
HANYANG PATENT FIRM (KR)
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