Title:
EXPOSURE PLATFORM APPARATUS AND EXPOSURE MACHINE
Document Type and Number:
WIPO Patent Application WO/2022/032892
Kind Code:
A1
Abstract:
An exposure platform apparatus and an exposure machine. The exposure platform apparatus comprises a working platform (100) and an adjusting mechanism (200). The working platform (100) is formed by combining a plurality of platforms independent of one another, and the adjusting mechanism (200) can separately adjust the height of each of the plurality of platforms independent of one another. By dividing the working platform (100) into multiple independent platforms, when one certain independent platform is damaged, only the damaged one needs to be replaced; and the present invention thus is convenient in replacement and saves cost. Moreover, the height of the plurality of independent platforms can be adjusted separately; the present invention thus can be easily adjusted.
Inventors:
DING HUALONG (CN)
Application Number:
PCT/CN2020/126340
Publication Date:
February 17, 2022
Filing Date:
November 04, 2020
Export Citation:
Assignee:
TCL CHINA STAR OPTOELECTRONICS TECH CO LTD (CN)
International Classes:
G03F7/20
Foreign References:
| KR100891307B1 | 2009-03-31 | |||
| CN111158218A | 2020-05-15 | |||
| US6262796B1 | 2001-07-17 | |||
| CN106802537A | 2017-06-06 | |||
| CN107908079A | 2018-04-13 | |||
| CN104294216A | 2015-01-21 |
Attorney, Agent or Firm:
PURPLEVINE INTELLECTUAL PROPERTY (SHENZHEN) CO., LTD. (CN)
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