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Patent Searching and Data


Title:
EXTEND GROUND STRAPS LIFETIME IN PECVD PROCESS CHAMBER
Document Type and Number:
WIPO Patent Application WO/2018/218612
Kind Code:
A1
Abstract:
A substrate processing chamber (102) includes a plurality of ground straps (130) coupled to the substrate support (118) and chamber floor. A first end (234) of the ground strap (130) is vertically offset from a second end (236) of the ground strap (130). A substrate processing chamber (102) includes one or more ceramic plates (590) coupled to an outer perimeter of the substrate support (118) to reduce film deposition on the chamber walls (106), substrate support (118), and ground straps (130). A substrate processing chamber (102) includes one or more ground straps (130) coupled to the substrate support (118) and chamber floor. Each ground strap (130) includes an L-type block (462, 472) at one or both ends to reduce the exposed length of the ground strap (130). The apparatus extend ground strap lifetime, improve overall chamber performance, and reduce RF frequency variation in the chamber.

Inventors:
SU XIAOMING (CN)
SHANG ZEREN (CN)
GUI YI (US)
TINER ROBIN L (US)
SUN SHIH YAO (TW)
Application Number:
PCT/CN2017/086853
Publication Date:
December 06, 2018
Filing Date:
June 01, 2017
Export Citation:
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Assignee:
APPLIED MATERIALS INC (US)
SU XIAOMING (CN)
International Classes:
C23C16/50
Foreign References:
US20040250955A12004-12-16
CN101187013A2008-05-28
CN101882567A2010-11-10
US20030154922A12003-08-21
US8381677B22013-02-26
Attorney, Agent or Firm:
LECOME INTELLECTUAL PROPERTY AGENT LTD. (CN)
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