Title:
EXTENDED LIFE DEPOSITION RING
Document Type and Number:
WIPO Patent Application WO/2012/024061
Kind Code:
A3
Abstract:
A process kit for a semiconductor processing chamber is provided. In one embodiment, a process kit includes an annular deposition ring body comprising a trough recessed into an upper surface of the body wherein a lowest point of the trough extends to at least half of the thickness of the ring body as defined by a top wall and a bottom wall. In another embodiment, a process kit includes an annular deposition ring body comprising a sloped upper wall defining at least a portion of an upper surface of the body, wherein a peak of the sloped upper wall extends from an inner wall of the body to at least half of a distance between the inner wall and an outer wall of the body.
Inventors:
HAWRYLCHAK LARA (US)
Application Number:
PCT/US2011/045223
Publication Date:
April 26, 2012
Filing Date:
July 25, 2011
Export Citation:
Assignee:
APPLIED MATERIALS INC (US)
HAWRYLCHAK LARA (US)
HAWRYLCHAK LARA (US)
International Classes:
H01L21/205; H01L21/203
Foreign References:
| US7520969B2 | 2009-04-21 | |||
| US20060219172A1 | 2006-10-05 | |||
| US20090050272A1 | 2009-02-26 |
Attorney, Agent or Firm:
PATTERSON, B. Todd et al. (L.L.P.3040 Post Oak Blvd., Suite 150, Houston Texas, US)
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