Title:
EXTREME ULTRAVIOLET LIGHT GENERATING SYSTEM
Document Type and Number:
WIPO Patent Application WO/2014/203804
Kind Code:
A1
Abstract:
An extreme ultraviolet light generating system of the present invention may be provided with: a laser apparatus that supplies pulsed laser light to the inside of a chamber where EUV light is generated; a light shutter that is disposed on an optical path of the pulsed laser light; and a control unit that controls to open/close the light shutter on the basis of generation signals supplied from an external apparatus, said generation signals instructing generation of the EUV light.
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Inventors:
YABU TAKAYUKI (JP)
SAITO TAKASHI (JP)
WAKABAYASHI OSAMU (JP)
SAITO TAKASHI (JP)
WAKABAYASHI OSAMU (JP)
Application Number:
PCT/JP2014/065638
Publication Date:
December 24, 2014
Filing Date:
June 12, 2014
Export Citation:
Assignee:
GIGAPHOTON INC (JP)
International Classes:
H05G2/00; H01L21/027
Foreign References:
| JP2012191171A | 2012-10-04 | |||
| JP2013065804A | 2013-04-11 |
Attorney, Agent or Firm:
TSUBASA PATENT PROFESSIONAL CORPORATION (JP)
Patent business corporation wings international patent firm (JP)
Patent business corporation wings international patent firm (JP)
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