Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS
Document Type and Number:
WIPO Patent Application WO/2018/203369
Kind Code:
A1
Abstract:
An extreme ultraviolet light generation apparatus according to one aspect of the present invention is provided with: a chamber in which extreme ultraviolet light is generated when tin is irradiated with a laser beam; a hydrogen gas supply path that connects the chamber with a hydrogen gas output part of a hydrogen gas supply device functioning as a supply source of a hydrogen gas supplied to the inside of the chamber, and that receives a supply of hydrogen gas from the hydrogen gas supply device and supplies the hydrogen gas supplied from the hydrogen gas supply device to the chamber; a temperature adjusting part that is connected to the hydrogen gas supply path and adjusts the temperature of the hydrogen gas to 16°C or lower; and a gas discharge part that is connected to the chamber and discharges to the outside of the chamber a gas including at least the hydrogen gas in the chamber.

Inventors:
HORI TSUKASA (JP)
HOSODA HIROKAZU (JP)
Application Number:
PCT/JP2017/017159
Publication Date:
November 08, 2018
Filing Date:
May 01, 2017
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
GIGAPHOTON INC (JP)
International Classes:
G03F7/20; H05G2/00
Foreign References:
JP2013004369A2013-01-07
JP2012523106A2012-09-27
JP2010219516A2010-09-30
JP2013522866A2013-06-13
JP2013506280A2013-02-21
Attorney, Agent or Firm:
MATSUURA, Kenzo (JP)
Download PDF: