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Patent Searching and Data


Title:
EXTREME ULTRAVIOLET LIGHT GENERATION DEVICE
Document Type and Number:
WIPO Patent Application WO/2015/041260
Kind Code:
A1
Abstract:
 The present invention makes it possible to generate stable EUV light in an appropriate state. This extreme ultraviolet light generation device may be provided with: a chamber in which a target supplied to an inner plasma generation region is converted to plasma and extreme ultraviolet light is generated; a target supply unit which supplies the target to the plasma generation region by outputting the target as droplets into the chamber; a droplet detector which detects droplets that advance from the target supply unit to the plasma generation region; an imaging unit which captures an image of an imaging region within the chamber that includes the plasma generation region; and a control unit which controls the timing of the image capture by the imaging unit of the imaging region on the basis of the timing of the detection by the droplet detector of the droplets.

Inventors:
SUZUKI TORU (JP)
ABE TAMOTSU (JP)
WAKABAYASHI OSAMU (JP)
YANAGIDA TATSUYA (JP)
Application Number:
PCT/JP2014/074594
Publication Date:
March 26, 2015
Filing Date:
September 17, 2014
Export Citation:
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Assignee:
GIGAPHOTON INC (JP)
International Classes:
H05G2/00; G03F7/20; H01L21/027
Foreign References:
JP2012199512A2012-10-18
JP2013030546A2013-02-07
JP2007528607A2007-10-11
JP2012134433A2012-07-12
JP2013004258A2013-01-07
Attorney, Agent or Firm:
EBISU International Patent Office (JP)
Patent business corporation エビス international patent firm (JP)
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