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Title:
EXTREME ULTRAVIOLET LIGHT GENERATION METHOD
Document Type and Number:
WIPO Patent Application WO/2018/029759
Kind Code:
A1
Abstract:
An extreme ultraviolet light generation method according to one aspect of the present application, wherein a droplet is outputted to a first laser irradiation region that is a different region from a plasma generation region, the droplet, having arrived at the first laser irradiation region, is irradiated with a first laser to generate a deformation liquid target, the deformation liquid target, having arrived at a second laser irradiation region that is a different region from the plasma generation region, is irradiated with a second laser to generate a fragment jet target, and at least one portion of the fragment jet target, having arrived at the plasma generation region, is irradiated with a third laser, which propagates in a direction intersecting the propagation direction of the second laser.

Inventors:
YANAGIDA, Tatsuya (400 Oaza Yokokurashinden, Oyama-sh, Tochigi 58, 〒3238558, JP)
Application Number:
JP2016/073331
Publication Date:
February 15, 2018
Filing Date:
August 08, 2016
Export Citation:
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Assignee:
GIGAPHOTON INC. (400 Oaza Yokokurashinden, Oyama-shi Tochigi, 58, 〒3238558, JP)
International Classes:
H05G2/00
Attorney, Agent or Firm:
MATSUURA, Kenzo (Matsuura & Associates, P.O. Box 176 Shinjuku Sumitomo Bldg. 23F, 6-1, Nishi-shinjuku 2-chome, Shinjuku-k, Tokyo 23, 〒1630223, JP)
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