EXTREME ULTRAVIOLET LIGHT GENERATION METHOD

Title:

EXTREME ULTRAVIOLET LIGHT GENERATION METHOD

Document Type and Number:

WIPO Patent Application WO/2018/029759

Kind Code:

A1

Abstract:

An extreme ultraviolet light generation method according to one aspect of the present application, wherein a droplet is outputted to a first laser irradiation region that is a different region from a plasma generation region, the droplet, having arrived at the first laser irradiation region, is irradiated with a first laser to generate a deformation liquid target, the deformation liquid target, having arrived at a second laser irradiation region that is a different region from the plasma generation region, is irradiated with a second laser to generate a fragment jet target, and at least one portion of the fragment jet target, having arrived at the plasma generation region, is irradiated with a third laser, which propagates in a direction intersecting the propagation direction of the second laser.

More Like This:

JPH0744020	INDUSTRIAL APPLICABILITY: X-ray extraction device for plasma X-ray source
JP5656014	Plasma light source and plasma light generation method
JP6426155	Dielectric wall accelerator utilizing diamond or diamond-like carbon

Inventors:

YANAGIDA TATSUYA (JP)

Application Number:

PCT/JP2016/073331

Publication Date:

February 15, 2018

Filing Date:

August 08, 2016

Export Citation:

Click for automatic bibliography generation Help

Assignee:

GIGAPHOTON INC (JP)

International Classes:

H05G2/00

Foreign References:

JP2015532505A	2015-11-09
JP2013251100A	2013-12-12
JP2016518674A	2016-06-23

Attorney, Agent or Firm:

MATSUURA, Kenzo (JP)

Download PDF:

View/Download PDF PDF Help

Previous Patent: CONTROL METHOD AND CONTROL DEVICE FOR AUTOMATICALLY DRIVEN VEHICLES

Next Patent: OPERATING DEVICE AND BREAKER